发明名称 Integrated MOSFET devices with Schottky diodes and associated methods of manufacturing
摘要 The present technology discloses a semiconductor die integrating a MOSFET device and a Schottky diode. The semiconductor die comprises a MOSFET area comprising the active region of MOSFET, a Schottky diode area comprising the active region of Schottky diode, and a termination area comprising termination structures. Wherein the Schottky diode area is placed between the MOSFET area and the termination area such that the Schottky diode area surrounds the MOSFET area.
申请公布号 US8735968(B2) 申请公布日期 2014.05.27
申请号 US20100980143 申请日期 2010.12.28
申请人 LI TIESHENG;ZHANG LEI;MONOLITHIC POWER SYSTEMS, INC. 发明人 LI TIESHENG;ZHANG LEI
分类号 H01L27/105;H01L21/8234 主分类号 H01L27/105
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