| 摘要 |
PURPOSE: A single type cleaning apparatus for a substrate is provided to prevent damage to a peripheral device due to a washing solution by installing a flow protector of ring type on the circumference of a rotation shaft. CONSTITUTION: A single type cleaning apparatus for a substrate is composed of a spin chuck, a rotation shaft, and a flow protector. The rotation shaft(130) is installed at the lower part of the spin chuck. The flow protector(150) includes a spray port(151) spraying a purge gas to the rotation shaft and a suction port(152) generating a negative pressure. The flow protector has the ring type and is installed the circumference of the rotation shaft. |
