METHOD FOR MANUFACTURING MASK PATTERN, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROGRAM FOR MANUFACTURING MASK PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a low-cost semiconductor device that can be miniaturized.SOLUTION: A method of manufacturing a semiconductor device comprises the steps of: forming a first photoresist pattern on a first film; curing the first photoresist pattern; forming a second photoresist pattern on the first film so as to partially overlap with the first photoresist pattern in a planar view; and etching the first film using the first and second photoresist patterns as a mask.