| 摘要 |
PROBLEM TO BE SOLVED: To provide a wafer holder for a wafer prober which can maintain the high-precision flatness of the upper surface of a chuck top at a normal temperature with high precision, not only at a normal temperature but also during heating and cooling. SOLUTION: A wafer holder for a wafer prober includes a chuck top having a wafer-mounting surface; a temperature controlling means that is installed on the surface of the opposite side from the wafer-mounting surface in the chuck top; a support for supporting the chuck top and/or the temperature control means; and a bottom plate installed at the lower part of the support. The thermal expansion coefficient of the bottom plate is thermal expansion coefficient of the chuck top or higher; and if the thermal conductivity of the chuck top, the support, and the bottom plate are defined as K1, K2, and K3, respectively, the relations K1>K2 and K3>K2 hold. COPYRIGHT: (C)2011,JPO&INPIT |
