APPARATUS FOR THERMAL LASER PROCESS

摘要

The present invention relates to a laser thermal process apparatus, more particularly, to a laser thermal process apparatus which does not expose a substrate to oxygen in a process of performing a crystallization thermal process through laser. An embodiment of the present invention comprises: a reaction chamber which locates a substrate support in an internal space and has a window on the top surface; a deoxidation module which is located in between the window and substrate support and has a slit-shaped spray slit for spraying noble gas; a laser irradiator for irradiating the internal space of the reaction chamber through the window with laser beam; a cylinder which is installed in the outside of the deoxidation module and has an incident slit in the longitudinal direction on the side wall; a noble gas spray pipe which is inserted to the cylinder for sending the noble gas to the spray slit; a noble gas supply pipe for supplying the noble gas to one and the other ends of the noble gas spray pipe; a flowmeter for measuring the amount of the noble gas sprayed through the one and the other ends; a bent buffering fluid path which is installed in between the cylinder and deoxidation module and of which one end is connected to the spray slit and the other end is connected to the incident slit; and a spray control unit for individually controlling the amount of spray of the one and the other ends of the noble gas supply pipe according to the measured amount of sprayed noble gas.