发明名称 |
METHOD FOR FABRICATING CAPACITOR HAVING RUTILE TITANIUM OXIDE DIELECTRIC FILM |
摘要 |
A method for fabricating a capacitor includes: (1) forming a bottom electrode on a substrate; (2) forming a template layer on the bottom electrode; (3) performing a plurality of atomic layer deposition (ALD) cycles by using water vapor as an oxidant thereby depositing a first TiO2 layer on the template layer; and (4) performing ozone pulse and purge step to transform entire thickness of the first TiO2 layer into rutile phase. |
申请公布号 |
US2014134821(A1) |
申请公布日期 |
2014.05.15 |
申请号 |
US201414147603 |
申请日期 |
2014.01.06 |
申请人 |
NANYA TECHNOLOGY CORP. |
发明人 |
HSIEH CHUN-I;BHAT VISHWANATH |
分类号 |
H01L49/02 |
主分类号 |
H01L49/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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