发明名称 |
Susceptor and Chemical Vapor Deposition Apparatus including the same |
摘要 |
<p>A susceptor and a chemical vapor deposition (CVD) apparatus including the same. The susceptor has a shape of a disk with a hollow and includes a plurality of pockets formed in an upper surface of the susceptor to accommodate deposition targets; and susceptor channels formed in the susceptor to supply a flowing gas to the plurality of pockets. Inlets of the susceptor channels are formed in a sidewall of the hollow. Alternatively, the inlets of the susceptor channels are formed in a lower surface of the susceptor and a reinforcement unit is further formed.
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申请公布号 |
EP2398047(A3) |
申请公布日期 |
2014.05.14 |
申请号 |
EP20110156820 |
申请日期 |
2011.03.03 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, YOUNG-KI;JUNG, HO-IL;KOH, CHONG-MANN;HAN, SUNG-IL |
分类号 |
H01L21/687;C23C16/455;C23C16/458 |
主分类号 |
H01L21/687 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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