发明名称 BATCH TYPE SEMICONDUCTOR MANUFACTURING DEVICE
摘要 <p>A batch type substrate processing device is disclosed. According to an embodiment of the present invention, the batch type substrate processing device is a batch type substrate processing device (100) which includes a boat (200) loaded on vertically accumulated multiple substrates (10), by comprising: a ring holder (300) which supports the bottom of a substrate (10) and where the substrate (10) is seated; a supporting rod (260) which is placed by protruding from vertical frames (220, 240) of a boat (200) and supports the bottom of the ring holder (300), and where the ring holder (300) is seated; and an end effector (400) which enters the boat (300) while accommodating a space in the same flat surface as the ring holder (300) from the external side of the outer circumferential surface of the ring holder (300), and supports the bottom of the substrate (10) in order to load the substrate (10) in the boat (200) in a bottom-lift method or to perform unloading from the boat (200).</p>
申请公布号 KR20140058270(A) 申请公布日期 2014.05.14
申请号 KR20120125073 申请日期 2012.11.06
申请人 TERASEMICON CORPORATION 发明人 LEE, BYUNG IL;LEE, YOUNG HO;KIM, HEE SEOK
分类号 H01L21/683;H01L21/677 主分类号 H01L21/683
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