METHOD FOR MANUFACTURING GROUP III NITRIDE FILM

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a group III nitride film capable of separating the group III nitride film grown on a substrate and having the same composition of constituent elements as the substrate at a high yield.SOLUTION: A method for manufacturing a group III nitride film comprises the steps of: growing a first III group nitride film 11 having the same composition of constituent elements as a group III nitride substrate 10 and a Si concentration of 1×10cmor more on the group III nitride substrate 10; growing a second III group nitride film 12 having the same composition of constituent elements as the first III group nitride film 11 and each impurity concentration of 1-2×10cmor less on the first III group nitride film 11; and decomposing the first III group nitride film 11 by irradiating a laminated film sheet 1 having the first III group nitride film 11 and the second III group nitride film 12 grown in this order on the group III nitride substrate 10 with a laser beam L having a wavelength of 8 μm or more and 12 μm or less to separate the second III group nitride film 12 from the group III nitride substrate 10.