| 摘要 |
PROBLEM TO BE SOLVED: To provide a resin composition capable of forming a pattern resin film having no residual in concavity in a process of forming the pattern resin film, a method of manufacturing an organic layer using the resin composition, the organic layer obtained by the method of manufacturing, and a semiconductor element having the organic layer.SOLUTION: A resin composition contains (a) an alkali soluble resin having a phenolic hydroxyl group and (b) an acrylic resin, and the (b) acrylic resin has absorbance at 660 nm measured by a spectrophotometer after agitating and mixing with tetramethylammonium hydroxide (TMAH) at the concentration of 0.3 mass% for 30 seconds and standing for 10 minutes of 0.06 or less. It is preferable to contain further (c) a photosensitizer and (d) a crosslinking agent. A method of manufacturing an organic layer includes a process of coating the resin composition on a base plate and drying it to form a resin film, a process of exposing and developing the resin film to form a pattern resin film, and a process of heating the pattern resin film to form an organic layer. |
