发明名称 SPUTTERING TARGET AND MANUFACTURING METHOD THEREFOR
摘要 <p>Provided is a Cu-In-Ga-Se alloy sputtering target used when forming a CIGS film for forming a light-absorbing layer for a solar cell having a high photoelectric conversion efficiency. Said sputtering target is a sintered body consisting primarily of copper, indium, gallium, and selenium, with the remainder comprising unavoidable impurities, and the atomic ratio of selenium (Se/(Se+Cu+In+Ga)) in the base material for said sintered body is between 50.1% and 60%, inclusive.</p>
申请公布号 WO2014069652(A1) 申请公布日期 2014.05.08
申请号 WO2013JP79841 申请日期 2013.11.05
申请人 MITSUBISHI MATERIALS CORPORATION 发明人 ZHANG SHOUBIN;UMEMOTO KEITA
分类号 C23C14/34;H01L31/06 主分类号 C23C14/34
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