发明名称 GAS-BARRIER FILM, METHOD FOR PRODUCING GAS-BARRIER FILM, AND ELECTRONIC DEVICE
摘要 <p>There is provided a gas barrier film which has high barrier performance and is excellent in bending resistance and smoothness as well as cutting processing suitability; a method for producing the gas barrier film; and an electronic device in which the gas barrier film is used. A gas barrier film, comprising a gas barrier layer unit on at least one surface side of a base, wherein the gas barrier layer unit comprises a first barrier layer formed by a chemical vapor deposition method, a second barrier layer obtained by performing conversion treatment to a coating film formed by coating a silicon compound onto the first barrier layer and an intermediate layer between the first barrier layer and the base.</p>
申请公布号 EP2650121(A4) 申请公布日期 2014.05.07
申请号 EP20110846279 申请日期 2011.11.30
申请人 KONICA MINOLTA, INC. 发明人 HONDA, MAKOTO;TAKEMURA, CHIYOKO
分类号 B32B9/00;B05D3/06;C08J7/04;C08J7/12;C23C14/06;C23C18/12;C23C18/14;H01L51/50;H05B33/02;H05B33/04 主分类号 B32B9/00
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