发明名称 |
GAS-BARRIER FILM, METHOD FOR PRODUCING GAS-BARRIER FILM, AND ELECTRONIC DEVICE |
摘要 |
<p>There is provided a gas barrier film which has high barrier performance and is excellent in bending resistance and smoothness as well as cutting processing suitability; a method for producing the gas barrier film; and an electronic device in which the gas barrier film is used. A gas barrier film, comprising a gas barrier layer unit on at least one surface side of a base, wherein the gas barrier layer unit comprises a first barrier layer formed by a chemical vapor deposition method, a second barrier layer obtained by performing conversion treatment to a coating film formed by coating a silicon compound onto the first barrier layer and an intermediate layer between the first barrier layer and the base.</p> |
申请公布号 |
EP2650121(A4) |
申请公布日期 |
2014.05.07 |
申请号 |
EP20110846279 |
申请日期 |
2011.11.30 |
申请人 |
KONICA MINOLTA, INC. |
发明人 |
HONDA, MAKOTO;TAKEMURA, CHIYOKO |
分类号 |
B32B9/00;B05D3/06;C08J7/04;C08J7/12;C23C14/06;C23C18/12;C23C18/14;H01L51/50;H05B33/02;H05B33/04 |
主分类号 |
B32B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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