| 摘要 |
<p>An object is to provide an illumination apparatus that achieves illumination with a uniform illuminance distribution, while reducing a light quantity loss. An illumination apparatus for illuminating an illumination target surface has: a deflection member configured to form an illuminance distribution with a periodic pattern along a predetermined direction on a predetermined face traversing an optical path; and an optical integrator system having a plurality of wavefront division facets arrayed on the predetermined face and configured to form secondary light sources with use of a beam from the deflection member; the deflection member forms the illuminance distribution with the periodic pattern of an integer times or a unit fraction times an array period of the plurality of wavefront division facets.</p> |
