发明名称 MANUFACTURING METHOD OF DROPLET DISCHARGE HEAD AND IMAGE FORMATION DEVICE HAVING DROPLET DISCHARGE HEAD MANUFACTURED BY ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a droplet discharge head capable of preventing sticking of refuse to the droplet discharge head and the occurrence of a flaw of the droplet discharge head caused in dry etching processing, in its turn, capable of improving processing accuracy and productivity.SOLUTION: The manufacturing method includes a process of forming a mask pattern of a trimming shape, a process of processing-forming a through-part composed of a frame groove 23a of the trimming shape by dry-etching in a state of sticking a film substrate 21 to a protective substrate 3' for forming the mask pattern and processing-forming an island-shaped remaining part 15'' on the inside by forming the frame groove 23a in the trimming shape and a process of simultaneously removing the island-shaped remaining part 15'' remaining on the inside by forming the frame groove 23a of the trimming shape when separating the film substrate 21 from the protective substrate 3', when manufacturing the protective substrate 3' having a through-part positioned in response to a pressurizing liquid chamber and relatively wide in an opening width and a through-part positioned in response to a common liquid chamber and relatively narrower in the opening width than the through-part wide in the opening width.
申请公布号 JP2014076564(A) 申请公布日期 2014.05.01
申请号 JP20120224683 申请日期 2012.10.10
申请人 RICOH CO LTD 发明人 ABE SHUYA;FUJIMOTO EIJI
分类号 B41J2/16 主分类号 B41J2/16
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