| 摘要 |
A substrate cleaning apparatus is provided to improve the reliability of the apparatus by completely seal the cleaning space from outside. A bath(10) provides the cleaning space in which all parts except for vertical slit type paths for incoming and outgoing of the substrate(S) are shut tightly. A transport unit(20) transfers the substrate in the inner side cleaning space of the bath. A transfer guide part(30) steadily fixes the substrate while being transferred by the transport unit. An imbedded cleaning water inlet tube(40) flows the cleaning water from the outside to the wall inside of the bath. A plurality of cleaning nozzles(50) are combined with the inner side of the bath. A plurality of cleaning nozzles spray the cleaning water flowed into the imbedded cleaning water inlet tube to the transferred substrate. A support stand(60) supports the bath with inclination. |
