| 摘要 |
PURPOSE: An atomic layer deposition device for forming uniform plasma is provided to improve a quality of a thin film being deposited on a substrate by forming the density of plasma particles on the atomic layer deposition device. CONSTITUTION: An atomic layer deposition device (100) for forming uniform plasma includes a process chamber (101), a susceptor (102), a shower head (103), a plasma forming unit (104), and a plasma generating unit (105). The shower head is divided into a plurality of spraying regions providing different gases for deposition respectively on a substrate. The plasma generating unit converts the gases for deposition into a plasma state. The plasma forming unit forms the density of plasma particles uniform and forms a magnetic field with a permanent magnet or an electromagnet. |
