| 摘要 |
PROBLEM TO BE SOLVED: To provide a proximity exposure apparatus capable of quickly discharging compressed air that exists between a mask and a substrate to improve production efficiency when the mask is allowed to approach the substrate.SOLUTION: A proximity exposure apparatus 100 comprises a mask holder 20 and a control section 30. The mask holder 20 comprises a main body portion 21, vacuum means 32 for air chamber, and an air suction path 34. The main body portion 21 has a mask suction groove 22 which holds a peripheral portion of the mask 2 by suction, and an air chamber 27 positioned above the central portion of the mask 2. The control section 30 controls the pressure of the air chamber 27 to a first pressure value by which deflection caused by the self-weight of the mask 2 is corrected, under normal condition, and controls the pressure of the air chamber 27 to a second pressure value having higher pressure than the first pressure value in allowing the mask 2 to approach a substrate 1. |
