发明名称 SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD FOR THE SAME AND ESD CIRCUIT
摘要 A semiconductor structure and manufacturing method for the same, and an ESD circuit are provided. The semiconductor structure comprises a first doped region, a second doped region, a third doped region and a resistor. The first doped region has a first type conductivity. The second doped region has a second type conductivity opposite to the first type conductivity. The third doped region has the first type conductivity. The first doped region and the third doped region are separated by the second doped region. The resistor is coupled between the second doped region and the third doped region. An anode is coupled to the first doped region. A cathode is coupled to the third doped region.
申请公布号 US2014106532(A1) 申请公布日期 2014.04.17
申请号 US201314132021 申请日期 2013.12.18
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 CHEN HSIN-LIANG;CHAN WING-CHOR;WU SHYI-YUAN
分类号 H01L21/8222;H01L49/02 主分类号 H01L21/8222
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