| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint mold allowing easy release of an imprint mold from a transfer material without poor transfer of an uneven pattern to the transfer material or damage of the uneven pattern.SOLUTION: An imprint mold 130 is for transferring a pattern containing irregularities to a transfer material and has a substrate 133. On the upper surface of the substrate 133, an uneven pattern 132 for pattern transfer is formed. In a part of the upper surface of the substrate 133 adjacent to the uneven pattern 132, a release assisting pattern 131 which assists release of the transfer material after pattern transfer from the uneven pattern 132 is provided in a central part close to one side of the square substrate 133. |
