| 摘要 |
An exhaust gas processing method of the present invention includes sequentially introducing an exhaust gas from a semiconductor manufacturing equipment to a combustion-based detoxifying device, a dust collector, and a two-stage gas cleaning device, so as to process the exhaust gas, wherein the two-stage gas cleaning device is comprised of a first-stage gas cleaning device and a second-stage gas cleaning device, and gas cleaning is performed in the first gas cleaning device that uses water as a cleaning solution and subsequently in the second gas cleaning device that uses an alkaline aqueous solution as a cleaning solution. |
