薄膜形成方法,申请号TW097130421-传众专利搜索

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发明名称	薄膜形成方法
摘要
申请公布号	TWI433950	申请公布日期	2014.04.11
申请号	TW097130421	申请日期	2008.08.08
申请人	爱发科股份有限公司日本	发明人	赤松泰彦;大石佑一;新井真;清田淳也;石桥晓
分类号	C23C14/34	主分类号	C23C14/34
代理机构		代理人	林志刚台北市中山区南京东路2段125号7楼
主权项
地址	日本

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