发明名称 |
COMPOSITE CHARGED PARTICLE BEAM DEVICE, AND THIN SAMPLE PROCESSING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To suppress a curtain effect accompanying a finishing processing and acquire a less-striped observation image formed by ion beam processing, even when thinning a sample having a structure such as a semiconductor device.SOLUTION: A composite charged particle beam device comprises: an FIB (Focused Ion Beam) lens barrel 1 irradiating a thin sample 7 with an FIB 1b; a GIB (Gas Ion Beam) lens barrel 3 irradiating with a GIB 3b; a sample table 5 for mounting the thin sample 7; first inclination means inclining the thin sample 7 around a first inclination axis 8a of the sample table 5 that exists in a plane of a first surface 21 orthogonal to an FIB irradiation axis 1a and formed by the FIB irradiation axis 1a and a GIB irradiation axis 3a; and second inclination means inclining the thin sample 7 around an axis orthogonal to the FIB irradiation axis 1a and the first inclination axis 8a. |
申请公布号 |
JP2014063726(A) |
申请公布日期 |
2014.04.10 |
申请号 |
JP20130174802 |
申请日期 |
2013.08.26 |
申请人 |
HITACHI HIGH-TECH SCIENCE CORP |
发明人 |
TORIKAWA SHOTA;ASAHATA TATSUYA;SUZUKI HIDEKAZU |
分类号 |
H01J37/317;G01N1/28;H01J37/20;H01J37/28 |
主分类号 |
H01J37/317 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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