发明名称 |
Semiconductor structure with suppressed STI dishing effect at resistor region |
摘要 |
A method includes forming a first isolation feature of a first width and a second isolation feature of a second width in a substrate, the first width being substantially greater than the second width; forming an implantation mask on the substrate, wherein the implantation mask covers the first isolation feature and exposes the second isolation feature; performing an ion implantation process to the substrate using the implantation mask; and thereafter performing an etching process to the substrate. |
申请公布号 |
US8691673(B2) |
申请公布日期 |
2014.04.08 |
申请号 |
US201113115488 |
申请日期 |
2011.05.25 |
申请人 |
CHUANG HAK-LAY;ZHU MING;TEO LEE-WEE;YOUNG BAO-RU;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
CHUANG HAK-LAY;ZHU MING;TEO LEE-WEE;YOUNG BAO-RU |
分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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