AN APPARATUS AND METHOD FOR PURGING GASEOUS COMPOUNDS
摘要
A processing chamber is described having a gas evacuation flow path from the center to the edge of the chamber. Purge gas is introduced at an opening around a support shaft that supports a heater plate. A shaft wall around the opening directs the purge gas along the support shaft to an evacuation plenum. Gas flows from the evacuation plenum through an opening in a second plate near the shaft wall and along the chamber bottom to an opening coupled to a vacuum source. Purge gas is also directed to the slit valve.
申请公布号
WO2014052388(A1)
申请公布日期
2014.04.03
申请号
WO2013US61581
申请日期
2013.09.25
申请人
APPLIED MATERIALS, INC.
发明人
ROCHA-ALVAREZ, JUAN CARLOS;BANSAL, AMIT KUMAR;BALASUBRAMANIAN, GANESH;ZHOU, JIANHUA;SANKARAKRISHNAN, RAMPRAKASH