SILICON NITRIDE FILM DEPOSITION METHOD, ORGANIC ELECTRONIC DEVICE MANUFACTURING METHOD AND SILICON NITRIDE FILM DEPOSITION DEVICE

摘要

PROBLEM TO BE SOLVED: To improve sealing performance of a silicon nitride film as a sealing film.SOLUTION: A silicon nitride film deposition method of the present embodiment is a deposition method for depositing a silicon nitride film on a substrate housed in a processing container. The silicon nitride film deposition method comprises: supplying a process gas containing a silane gas and, a nitrogen gas and a hydrogen gas or an ammonia gas into the processing container; producing plasma by exciting the process gas and performing a plasma treatment by the produced plasma to deposit a silicon nitride film on the substrate; and applying a bias electric field to a part of the silicon nitride film by intermittently controlling ON/OFF of a high-frequency power source during or after deposition of the silicon nitride film.