发明名称 Modeling the total parasitic resistances of the source/drain regions of a multi-fin multi-gate field effect transistor
摘要 In the embodiments, a full resistive network is used to determine resistance contributions to the total parasitic resistance of each source/drain region of a multi-fin multi-gate field effect transistor (MUGFET). These resistance contributions include: a first resistance contribution of end portions of the fins, which are connected in pseudo-parallel by a local interconnect; second resistance contributions of segments of the local interconnect, which are connected in pseudo-series; and any other resistance contributions of any other resistive elements between the end portions of the fins and a single resistive element through which all the diffusion region current flows. The multi-fin MUGFET is then represented in a netlist as a simple field effect transistor with the total parasitic resistances represented as single resistive elements connected to the source/drain nodes of that field effect transistor. This simplified netlist is then used to simulate performance of the multi-fin MUGFET.
申请公布号 US8689166(B2) 申请公布日期 2014.04.01
申请号 US201213455181 申请日期 2012.04.25
申请人 LU NING;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 LU NING
分类号 G06F17/50 主分类号 G06F17/50
代理机构 代理人
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