发明名称 |
Resist composition, method of forming resist pattern and polymeric compound |
摘要 |
A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below (R1 represents a sulfur atom or an oxygen atom; R2 represents a single bond or a divalent linking group; and Y represents an aromatic hydrocarbon group or an aliphatic hydrocarbon group having a polycyclic group, provided that the aromatic hydrocarbon group or the aliphatic hydrocarbon may have a carbon atom or a hydrogen atom thereof substituted with a substituent. |
申请公布号 |
US8685620(B2) |
申请公布日期 |
2014.04.01 |
申请号 |
US201213670106 |
申请日期 |
2012.11.06 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
TAKAKI DAICHI;SHIONO DAIJU;UTSUMI YOSHIYUKI;KAIHO TAKAAKI |
分类号 |
G03F7/039;G03F7/20;G03F7/30 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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