| 摘要 |
PROBLEM TO BE SOLVED: To provide a pressure measurement apparatus capable of measuring pressure precisely.SOLUTION: The pressure measurement apparatus comprises: a first semiconductor layer 1; an insulating layer 2 arranged on a surface of the first semiconductor layer 1; a second semiconductor layer 3 arranged on a surface of the insulating layer 2; and a recess 10 formed from a bottom face 5 of the first semiconductor layer 1 across the insulating layer 2 to the inside of the second semiconductor layer 3. In the inside of the second semiconductor layer 3, a cross-sectional shape of the recess 10 is formed to be congruent with a cross-sectional shape of the inside of the insulating layer 2 and then a cross-sectional area of the recess 10 is increased toward a surface 4 of the second semiconductor layer 3. The pressure measurement apparatus further comprises strain resistance gauges 51, 53 which are provided on a portion covering the recess 10 of the second semiconductor layer 3. |
