| 摘要 |
Disclosed is an invention relating to a supply nozzle for a processing substrate. The supply nozzle for a processing substrate includes a nozzle body which has a receiving space for receiving a process solution for processing a substrate, a heat radiation part which is separated and fixed to the nozzle body part, a transfer body part which is reciprocally moved and combined between the nozzle body and the heat radiation part, and a reciprocating part which make the transfer body part reciprocate. When a process solution is supplied to the supply nozzle for processing a substrate, the surface tension of the process solution which is stored in the supply nozzle can be increased. |
