发明名称 Interconnect structures for stacked dies, including penetrating structures for through-silicon vias, and associated systems and methods
摘要 Interconnect structures for stacked dies, including penetrating structures for through-silicon vias, and associated systems and methods are disclosed. A system in accordance with a particular embodiment includes a first semiconductor substrate having a first substrate material, and a penetrating structure carried by the first semiconductor substrate. The system further includes a second semiconductor substrate having a second substrate material with a preformed recess. The penetrating structure of the first semiconductor substrate is received in the recess of the second semiconductor substrate and is mechanically engaged with the recess and secured to the second semiconductor substrate.
申请公布号 US8680654(B2) 申请公布日期 2014.03.25
申请号 US201313871484 申请日期 2013.04.26
申请人 MICRON TECHNOLOGY, INC. 发明人 FAY OWEN R.;FARNWORTH WARREN M.;HEMBREE DAVID R.
分类号 H01L29/40;H01L21/768;H01L23/48;H01L23/52 主分类号 H01L29/40
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