WAFER TABLE FOR IMMERSION LITHOGRAPHY

摘要

PROBLEM TO BE SOLVED: To provide a method and a device which can substantially confine liquid between a lens and a wafer table assembly of an immersion lithography system.SOLUTION: An exposure device comprises a lens and a wafer table assembly. The wafer table assembly comprises an upper surface and is arranged to be moved for the lens or at least one component while supporting a wafer. The upper surface of the wafer and an upper surface of the component are substantially flush with the upper surface of the wafer table assembly. The entire upper surface of the wafer table assembly comprising the upper surface of the wafer, the upper surface of the wafer table assembly and an upper surface of at least one component is substantially planer.