| 摘要 |
<p>This plasma processing device is provided with a processing vessel, a carrying stand, a top electrode, an extendable/retractable tube-shaped partition wall, a high-frequency power source, an electricity supply member, a drive frame, a drive mechanism, an evacuation device, and a baffle plate. The partition wall connects the carrying stand and the bottom wall of the processing vessel. The electricity supply member is disposed within the space encircled by the partition wall and connects to the carrying stand. The drive frame extends into the space encircled by the partition wall from the outside of the lateral wall of the processing vessel, and connects to the bottom of the carrying stand. The drive mechanism is disposed to the outside of the processing vessel, and causes the drive frame to move vertically. At the bottom of an evacuation space, an annular evacuation pathway is demarcated by the partition wall and the lateral wall and bottom wall of the processing vessel. The evacuation device is interconnected to the evacuation pathway via an evacuation opening at the bottom wall of the processing vessel.</p> |
