| 摘要 |
PURPOSE: The sputtering device capable of improving the quality of the thin film, the uniformity or the transparency of the film etc. for instance. CONSTITUTION: The sputtering device comprises the chamber (10), the sputtering target (20), the processed article supporting part (30), and the assemble movement assembly (60), and the horizontal feed assembly (50). The chamber provides the vacuumized enclosed space in which the sputtering process is performed. The chamber is comprised with a door in which the processed article is flow in and out to the inside of chamber. The sputtering target is arranged in the inside of chamber. The supporting device for the processed article comprised with the arrival plate in which the processed article is arrived, and the heating plate to heat up the processed article which is arrived. The assemble movement assembly circulates the supporting part of processed article. |
