光罩基底用基板之制造方法、反射型光罩基底之制造方法、及反射型光罩之制造方法,申请号TW098136086-传众专利搜索

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发明名称	光罩基底用基板之制造方法、反射型光罩基底之制造方法、及反射型光罩之制造方法
摘要
申请公布号	TWI430349	申请公布日期	2014.03.11
申请号	TW098136086	申请日期	2009.10.23
申请人	ＨＯＹＡ股份有限公司日本	发明人	盐田勇树
分类号	H01L21/304;H01L21/306	主分类号	H01L21/304
代理机构		代理人	陈长文台北市松山区敦化北路201号7楼
主权项
地址	日本

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