氧化锡－氧化镁系溅镀靶及透明半导体膜,申请号TW097145698-传众专利搜索

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发明名称	氧化锡－氧化镁系溅镀靶及透明半导体膜
摘要
申请公布号	TWI429776	申请公布日期	2014.03.11
申请号	TW097145698	申请日期	2008.11.26
申请人	出光兴产股份有限公司日本	发明人	井上一吉;岛根幸朗
分类号	C23C14/34;H01B1/02	主分类号	C23C14/34
代理机构		代理人	恽轶群台北市松山区南京东路3段248号7楼;陈文郎台北市松山区南京东路3段248号7楼
主权项
地址	日本

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