发明名称 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DEVICE
摘要 PURPOSE: An exposing apparatus, an exposing method, and a method for manufacturing a device are provided to maintain the processing amount of the exposing apparatus and cost effectively manufacture devices with the high quality. CONSTITUTION: An exposing apparatus(1) includes a projection optical system(10) projecting the pattern of a mask(23) on the surface of a substrate. A driving part(60) drives a chuck(35) supporting the substrate. A measuring part(70) measures the height of the substrate at a plurality of points. A controlling part(80) controls a height measuring process and a chuck driving process.
申请公布号 KR101372745(B1) 申请公布日期 2014.03.10
申请号 KR20100097792 申请日期 2010.10.07
申请人 发明人
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
代理机构 代理人
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