| 摘要 |
An annealing apparatus is disclosed. The annealing apparatus according to the embodiment of the present invention includes: a chamber which includes an opening part on one side thereof to input and output a substrate; a frame which is arranged in the chamber and includes a plurality of layers to vertically receive a plurality of substrates with a preset space; a heater which is arranged in the chamber and thermally processes the substrate; a cabinet in which the chamber is received; and a lifting unit which is combined with the cabinet and vertically moves the frame in the chamber. The annealing apparatus according to the embodiment of the present invention uniformly anneals the substrate and increases the number of substrates processed in one chamber. |
