| 摘要 |
PURPOSE: A chemical vapor deposition apparatus is provided to uniformly deposit a crystal layer on a substrate by smoothly mixing different gases and uniformly discharging processing gases. CONSTITUTION: A shower head(200) includes a body, a first gas chamber(220), and a second gas chamber(230). The first gas chamber is formed in the body and includes a plurality of first outlets to discharge a first gas. The second gas chamber is formed in the body and includes a plurality of second outlets to discharge a second gas. The first gas chamber and the second gas chamber are adjacently arranged in a susceptor rotating direction on the same plane. The first outlets and the second outlets are formed on the same plane. |
