发明名称 Metal Pads with Openings in Integrated Circuits
摘要 A device includes a metal pad, and a passivation layer including portions overlapping edge portions of the metal pad. A Post-Passivation-Interconnect (PPI) includes a trace portion overlying the passivation layer, and a pad portion connected to the trace portion. A polymer layer includes an upper portion over the PPI, and a plug portion extending into, and encircled by, the pad portion of the PPI.
申请公布号 US2014061898(A1) 申请公布日期 2014.03.06
申请号 US201313764569 申请日期 2013.02.11
申请人 COMPANY, LTD. TAIWAN SEMICONDUCTOR MANUFACTURING;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 CHEN SHUO-MAO;HUANG YU-TING
分类号 H01L23/498 主分类号 H01L23/498
代理机构 代理人
主权项
地址