发明名称 TARGET CENTER POSITIONAL CONSTRAINT FOR PHYSICAL VAPOR DEPOSITION (PVD) PROCESSING SYSTEMS
摘要 Target assemblies for use in a substrate processing system are provided herein. In some embodiments, a target assembly for use in a substrate processing system may include a source material, a backing plate configured to support the source material on a front side of the backing plate, and a central support member to support the target assembly within the substrate processing system, wherein the central support member is coupled to a center portion of the backing plate and extends perpendicularly away from the backside of the backing plate.
申请公布号 US2014061041(A1) 申请公布日期 2014.03.06
申请号 US201313778383 申请日期 2013.02.27
申请人 APPLIED MATERIALS, INC. 发明人 RIKER MARTIN LEE;MILLER KEITH A.;RAMASAMY BALAMURUGAN;SHAH KARTIK
分类号 C23C14/34 主分类号 C23C14/34
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