| 摘要 |
An array substrate for the in-plane switching mode LCD and a manufacturing method thereof are provided to prevent the contrast ratio from being degraded by minimizing the stepped height between a common electrode and pixel electrode and a neighboring gate insulating layer. A method of manufacturing an array substrate for the in-plane switching mode LCD comprises the following steps of: forming a gate line(103), a gate electrode(108) and a common line(106) on a substrate; forming a gate insulating layer(116) which has a plurality of common contact holes(117) on the gate line, gate electrode and common line; and forming an active layer(121) of an island shape correspondingly to the gate electrode on the gate insulating layer and forming an impurity amorphous silicon pattern on the active layer. |
