| 摘要 |
PROBLEM TO BE SOLVED: To provide a plant cultivation apparatus which can evenly spread a nutrient solution on the whole area of a cultivation rack, while reducing the amount of the nutrient solution used therein as much as possible, and has good responsibility for the adjustment of the amount of the nutrient solution.SOLUTION: The plant cultivation apparatus has a cultivation rack 2 on whose upper surface cultivation containers are put, and a nutrient solution supply mechanism 4 for supplying the nutrient solution on the upper surface of the cultivation rack 2, wherein fine uneven structures 21 are formed on the approximately whole upper surface of the cultivation rack 2, and the nutrient solution supplied from the nutrient solution supply mechanism 4 is spread on the approximately whole upper surface of the cultivation rack 2 through the fine uneven structures 21. |
