| 摘要 |
The present invention relates to a chemical vapor deposition (CVD) apparatus for uniformly coating a spherical form, and to a CVD apparatus comprising: a vacuum chamber for forming a vacuum atmosphere in an inside in the predetermined size; a furnace equipped inside the vacuum chamber to accommodate a coated product; a heater part equipped around the furnace; a supply route for supplying a coating member to an inside of the furnace; an exhaust route for discharging gas supplied through the supply route to an outside; and a discharge route which is equipped in the floor surface of the furnace, and which is selectively opened to discharge the coated product to an outside. In the supply route, a nozzle is located to be adjacent to the floor surface of the furnace to mix the coated product by the pressure of the supplied coating member, and the nozzle is equipped inside a preheating furnace equipped in the upper part of the vacuum chamber, and a part covers the furnace after the nozzle is extended along the preheating furnace. Therefore, the supply route is composed for a coating member flowed inside to receive heat from the heater part. According to the present invention, the temperature inside the vacuum chamber is not hindered through the preheating furnace of the supply route, and a spherical coating target material is mixed by the pressure of the supplied gas, and effectively and uniformly coated. |
