| 摘要 |
<p>A resist stripping solution for stripping a resist on a substrate, being prepared in a non-aqueous condition, the resist stripping solution comprising: a first water-soluble organic solvent occupying 80 to 90% by mass of the resist stripping solution; a second water-soluble organic solvent occupying 1 to 15% by mass of the resist stripping solution; and an amino alcohol compound represented occupying 1 to 15% by mass of the resist stripping solution.</p> |
