THERMAL ANNEALING PROCESS

摘要

PROBLEM TO BE SOLVED: To provide a specific thermal annealing process for the directed self assembly of poly(styrene)-b-poly(siloxane) block copolymer film compositions deposited onto the surface of a substrate.SOLUTION: The process comprises applying a film of a copolymer composition comprising a poly(styrene)-b-poly(siloxane) block copolymer component and an antioxidant to a surface of a substrate; optionally, baking the film; annealing the film in a gaseous atmosphere containing 20 wt.% or more of oxygen; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(siloxane) in the annealed film to SiO.