| 摘要 |
PROBLEM TO BE SOLVED: To provide a drawing apparatus, an exposure drawing apparatus, a program, and a drawing method in which even when a circuit pattern is deformed corresponding to distortion of a basal plate, an electronic component can be mounted on the basal plate in high accuracy.SOLUTION: Coordinate data that show a first position on design of two or more base marks disposed on a basal plate to be exposed, coordinate data that show a drawing pattern drawn to the basal plate to be exposed determined based on the first position, and coordinate data that show respective actual second positions of two or more base marks are obtained (S101, 102), a gap compensation amount for compensating a gap between the first position and the second position for respective two or more base marks is derived (S111), the derived respective gap compensation amounts are reduced by a prescribed ratio (S115), when drawing a drawing pattern to the basal plate to be exposed depending on the coordinate data that show a drawing pattern based on the coordinate data that show the second position, the coordinate data that show a drawing pattern is compensated based on the reduced gap compensation amount (S117). |
