| 摘要 |
PROBLEM TO BE SOLVED: To provide a dip type wafer cleaner which can efficiently clean a wafer.SOLUTION: A wafer cleaner of the present invention comprises a chamber 5 having a plurality of washing tanks 8a and 8b to which washing liquid is fed and a wafer W can be inserted, and a wafer holding and carrying part 6 movably attached to the chamber 5 for immersing the wafer W into one of the washing tanks 8a and 8b in a state where the wafer W is held. The wafer W which has been immersed in the washing tank 8a can be immersed into the other washing tank 8a, after taking the wafer W out of the washing tank 8a. |
