发明名称 MINIENVIRONMENT AND TEMPERATURE CONTROL METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To achieve various types of processing for a substrate without being affected by distortion of thermal expansion by suppressing the distortion of thermal expansion by disturbance of a temperature distribution at a contact portion occurring while the substrate is being conveyed.SOLUTION: The minienvironment includes: an apparatus for opening and closing a transportation case storing a plurality of substrates; a transfer robot that transfers the substrates; a sensor that measures a temperature of the substrate; and control means that controls a temperature of a hand section of the transfer robot for holding the substrate to reach the temperature of the substrate measured by the sensor.
申请公布号 JP2014036070(A) 申请公布日期 2014.02.24
申请号 JP20120175559 申请日期 2012.08.08
申请人 HITACHI HIGH-TECH CONTROL SYSTEMS CORP 发明人 SUGAYA TOMOKAZU
分类号 H01L21/677 主分类号 H01L21/677
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