发明名称 |
OPTICAL METROLOGY FOR IN-SITU MEASUREMENTS |
摘要 |
A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof. |
申请公布号 |
WO2014027354(A1) |
申请公布日期 |
2014.02.20 |
申请号 |
WO2013IL50697 |
申请日期 |
2013.08.15 |
申请人 |
NOVA MEASURING INSTRUMENTS LTD. |
发明人 |
TUROVETS, IGOR;BOZDOG, CORNEL;ELYASI, DARIO |
分类号 |
G01B11/24;G01N21/00 |
主分类号 |
G01B11/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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