BAFFLE OF CHEMICAL VAPOR DEPOSITION

摘要

A baffle apparatus combined with chemical vapor deposition equipment comprises: a main plate where one or more gas inlets are formed for the inflow of gas; and a hole plate which is detachable from the main plate. A gas guide member where a penetrating hole is formed is attached or detached to or from the hole plate. The gas guide member is combined with fastening grooves formed on the hole plate.